Memory array of floating gate-based non-volatile memory cells

ABSTRACT

A memory array comprises a plurality of memory cells organized in a matrix of rows and columns. Each of the memory cells includes a high voltage access transistor, a floating gate memory transistor electrically connected to the access transistor, and a coupling capacitor electrically connected to the memory transistor. A first set of word lines are each electrically connected to the capacitor in each of the memory cells in a respective row. A second set of word lines are each electrically connected to the access transistor in each of the memory cells in a respective row. A first set of bit lines are each electrically connected to the access transistor in each of the memory cells in a respective column. A second set of bit lines are each electrically connected to the memory transistor in each of the memory cells in a respective column. Various combinations of voltages can be applied to the word lines and bit lines in operations to program, erase, read, or inhibit a logic state stored by the memory transistor in one or more of the memory cells.

This application is a divisional application of U.S. Ser. No.11/861,111, filed on Sep. 25, 2007, the disclosure of which isincorporated by reference. This application also claims the benefit ofpriority to U.S. Provisional Application No. 60/913,591, filed on Apr.24, 2007, the disclosure of which is incorporated by reference.

BACKGROUND

Non-volatile memory devices are used in applications that require storedinformation to be retained even when the memory devices are not powered.Examples of non-volatile memory devices include read-only memory (ROM),magnetic computer storage devices (e.g., hard disks, floppy diskdrives), optical disc drives, erasable programmable read-only memory(EPROM), electrically erasable programmable read-only memory (EEPROM),and flash memory.

EEPROMs have been widely used in electronic products because of theirnon-volatile functions of electrically writing and erasing data. AnEEPROM can be programmed and erased electrically. Flash memory is likeEEPROM in that it can also be electrically erased and programmed. Flashmemory stores information in an array of floating gate transistors,called “cells,” each of which traditionally stores one bit ofinformation. Newer flash memory devices, sometimes referred to asmulti-level cell devices, can store more than 1 bit per cell by usingmore than two levels of electrical charge placed on the floating gate ofa cell.

A limitation of conventional flash memory is that although it can beread or programmed a byte or a word at a time in a random accessfashion, the flash memory has to erase multiple memory locations(“blocks”) at a time. Changing a single byte is only possible byrewriting a whole block. Starting with a freshly erased block, anylocation within that block can be programmed. However, once a bit hasbeen set to 0, only by erasing the entire block can it be changed backto 1. In other words, conventional flash memory offers random-accessread and programming operations, but cannot offer arbitraryrandom-access rewrite or erase operations.

Another limitation of conventional flash memory as applied to standardcomplementary metal oxide semiconductor (CMOS) processes is the numberof additional masking operations required to embed a flash cell and theperipheral circuitry used in generation and routing of high voltagesignals.

SUMMARY

The present invention is related to a memory array comprising aplurality of memory cells organized in a matrix of rows and columns.Each of the memory cells includes a high voltage access transistor, afloating gate memory transistor electrically connected to the accesstransistor, and a coupling capacitor electrically connected to thememory transistor. A first set of word lines are each electricallyconnected to the coupling capacitor in each of the memory cells in arespective row. A second set of word lines are each electricallyconnected to the access transistor in each of the memory cells in arespective row. A first set of bit lines are each electrically connectedto the access transistor in each of the memory cells in a respectivecolumn. A second set of bit lines are each electrically connected to thememory transistor in each of the memory cells in a respective column.Various combinations of voltages can be applied to the word lines andthe bit lines in operations to program, erase, read, or inhibit a logicstate stored by the memory transistor in one or more of the memorycells.

BRIEF DESCRIPTION OF THE DRAWINGS

Features of the present invention will become apparent to those skilledin the art from the following description with reference to thedrawings. Understanding that the drawings depict only typicalembodiments of the invention and are not therefore to be consideredlimiting in scope, the invention will be described with additionalspecificity and detail through the use of the accompanying drawings, inwhich:

FIG. 1 is a schematic cross section view of a multiple time programmablememory cell according to one embodiment;

FIG. 2 is a schematic representation of a memory array according to oneembodiment; and

FIG. 3 is a schematic representation of a memory array according toanother embodiment.

DETAILED DESCRIPTION

In the following detailed description, embodiments are described insufficient detail to enable those skilled in the art to practice theinvention. It is to be understood that other embodiments may be utilizedwithout departing from the scope of the present invention. The followingdetailed description is, therefore, not to be taken in a limiting sense.

The complementary metal oxide semiconductor (CMOS) fabricationtechnology is a common fabrication technique for integrated circuitssuch as a p-channel and an n-channel MOSFET (metal oxide semiconductorfield-effect transistor) referred to herein as PMOS and NMOS,respectively. Since CMOS technology continues to use 5V input-output(I/O) devices with a gate dielectric thickness in the range of about10-15 nm, it is necessary to operate a memory cell at high positiveerase voltages (e.g., about 12 V to about 22 V).

The present invention is directed to a three transistor (3T) memoryarray that is built with PMOS floating gate-based non-volatile memorycells. The present memory array can be fabricated using conventionalCMOS technology with a thick gate oxide (e.g., about 125 Å). The memorycell and access transistor in the memory array can tolerate relativelyhigh erase voltages. The memory array is suitable for embedding in ageneral purpose CMOS process with arbitrarily thick I/O gate oxide asthe array does not require any additional processing. For example, thememory array can be employed in EEPROM or in a flash memory deviceembedded in a generic CMOS process with no additional masking andprocessing operations.

The present invention addresses the limitations of conventional flashmemory by providing a memory cell and access transistor built out ofelements native to a CMOS technology. High voltage routing can beaccomplished by devices capable of sustaining required voltages on oneterminal (drain) only, such as extended drain or drift metal oxidesemiconductor (DMOS) devices or true high voltage (HV) CMOS devices ifpresent in a given process. For applications that can tolerate the‘block’ erase function, the entire memory (cell array, erase chargepump, program charge pump, decoders) can be constructed from deviceswith standard I/O oxide thickness.

The PMOS-based memory array is constructed with a three transistorarchitecture in each memory cell, including a storage transistor, acoupling capacitor, and an access transistor. The programming event ofthe PMOS-based memory cell is defined as its transfer to the conductivestate. The program operation of the memory cell (i.e., injection andtrapping of negative charges on the floating gate) can be accomplishedby the channel hot carrier injection of secondary electrons generated byimpact ionization at the drain of the floating gate PMOS punch-thruevent (i.e., avalanche programming). The erase operation, which providesremoval of electrons stored in the PMOS floating gate that renders thePMOS non-conductive, is accomplished by Fowler-Nordheim tunneling. Thepresent memory array can be operated in a mode that allows byte by byte(and down to bit level) programming and erase.

Further details of the present invention are described as follows withrespect to the drawings.

FIG. 1 depicts a cross section of a multiple time programmable (MTP)PMOS floating-gate based non-volatile memory cell 100 that can beemployed in the memory array of the present invention. All elements ofmemory cell 100 can be built out of components intrinsic to a genericCMOS process flow with thick I/O oxide devices. The memory cell 100generally includes a floating gate memory transistor 120, a couplingcapacitor 140, and a high voltage access transistor 160. Each of thesecomponents is discussed in further detail hereafter.

The memory transistor 120 includes a p-type source region 122 spacedapart from a p-type drain region 124, both of which are formed in ann-type well 121 (N-well). The n-type well 121 is in turn formed in ap-type substrate 102. A channel region 126 is defined between sourceregion 122 and drain region 124. A layer of gate oxide 128 is formedover channel region 126, and a floating gate 130 such as a layer ofpolysilicon is formed over gate oxide 128. Since gate 130 is isolated,it is often referred to as a floating gate. An n-type region 123 is alsoformed within n-type well 121 adjacent to p-type source region 122. Then-type region 123 provides an ohmic body tie to n-type well 121, son-type well 121 can be tied to a terminal. A contact region 132 such asa layer of silicide is formed over p-type source region 122 and n-typeregion 123. A layer of silicide 134 can also be formed over p-type drainregion 124. Silicide formation may be optionally excluded from thefloating gate area by application of a conventional silicide blockprocess. A field oxide (FOX) region 136 isolates memory transistor 120from high voltage access transistor 160.

In the embodiment shown in FIG. 1, memory transistor 120 is a floatinggate PMOS transistor. The memory transistor 120 may also be referred toas a storage transistor, because it can be programmed to store a logicstate.

The coupling capacitor 140 includes spaced apart n-type diffusionregions 143 and 145 formed within an n-type well (N-well) 141, which isformed in p-type substrate 102. A channel region 146 is defined betweenn-type diffusion regions 143, 145, and a layer of gate oxide 148 isformed over channel region 146. A polysilicon top plate gate layer 150is formed over gate oxide 148 to form the coupling capacitor top plate.A contact region 153 such as a layer of silicide is formed over n-typediffusion region 143, and a layer of silicide 155 is formed over n-typediffusion region 145. A FOX region 135 isolates capacitor 140 frommemory transistor 120. Alternatively, the coupling capacitor can beformed as a conventional PMOS transistor or a gated diode capacitor (notshown).

The high voltage access transistor 160 includes both a p-type well 161(P-well) and an n-type well 171 (N-well). The n-type well 171 forms thedrain of transistor 160, with an n-type region 174 providing an ohmicbody tie to a silicide contact region 176. An n-type source region 162is formed in p-type well 161. A channel region 166 is defined betweenn-type source region 162 and n-type well 171. A layer of gate oxide 168is formed over part of the P-well and part of the N-well (includingwhere they abut one another), and a gate 180 is formed over gate oxide168, resulting in gate 180 being over channel 166. A p-type region 163is also formed within p-type well 161, next to n-type source region 162.The p-type region 163 provides an ohmic body tie to p-type well 161 sothat p-type well 161 is tied to ground.

A layer of silicide 165 is formed over n-type source region 162 andp-type region 163, to thereby form a contact region that is shown asbeing connected to ground. A FOX region 178 is formed in n-type well 171to isolate silicide contact region 176 from gate 180. It is thisisolation that enables access transistor 160 to withstand the highervoltages which occur during an erase operation.

In the embodiment shown in FIG. 1, high voltage access transistor 160 isa high voltage asymmetrical n-channel MOSFET (NDMOS) device. The highvoltage access transistor 160 may also be referred to as a high voltageselect transistor. Because of its extended drain 171, access transistor160 can also be referred to as a high voltage extended drain NMOStransistor. Alternatively, an NDMOS device designed for optimumperformance of a Bipolar CMOS DMOS (BCD) process can be employed as anaccess device. In a further alternative embodiment, if a technologysupports a set of high voltage devices, these can be used as accesstransistors.

A symmetrical parasitic NDMOS device can also be used as an accesstransistor. This device will have two regions of field oxide under bothedges of the gate polysilicon, with two N-wells used as S/D extensionsand a P-well region entirely under the gate polysilicon region of theDMOS device (structure not shown).

A p-type well (P-well) 192 is used to electrically isolate n-type well141 from n-type well 121, without contacting either of n-type well 121or n-type well 141. Similarly, a p-type well (P-well) 194 canelectrically isolate n-type well 121 from n-type well 171, withoutcontacting either of n-type well 121 or n-type well 171. The inclusionof p-type wells 192, 194 separated from N-wells by a region of lightlydoped Si allows for application of higher voltages by preventingpunch-thru between the neighboring n-type wells 121, 141 and theneighboring n-type wells 121, 171. Because of their function, p-typewells 192, 194 can be referred to as isolation wells. A similar approachcan be used to increase the breakdown voltage of the symmetrical or theasymmetrical NDMOS (i.e., P-well 161 can be separated from N-well 171 bya region of lightly doped Si).

In accordance with some embodiments of the present invention, each gateoxide layer 128, 148 and 168 can have a gate oxide thickness that is thesame as the gate oxide thickness of CMOS devices that are used as I/Ointerface devices having an operating voltage of 5V. In other words, thethickness for gate oxide layers 128, 148 and 168 can be native to thefabrication process for 5V I/O devices. This enables capacitor 140 andtransistors 120, 160 to be made using standard CMOS processes. Forexample, each gate oxide layer 128, 148 and 168 can have a thickness inthe range of about 10-15 nm (i.e., about 100-150 Å). In someembodiments, the thickness of each gate oxide layer 128, 148 and 168 canbe at least about 12 nm (i.e., at least about 120 Å). In otherembodiments, a gate oxide layer thickness of up to about 20 nm (i.e., upto about 200 Å) can be used, enabling such embodiments to be useful withdevices having even higher I/O voltages.

The memory cell 100 includes three terminals. A capacitor terminal(Vcap) is electrically connected to contact region 153 of capacitor 140.A program terminal (Vpp) is electrically connected to contact region 132of memory transistor 120. The Vpp terminal can be used for bothprogramming and erasing the memory cell. A control terminal (Vcg), alsoreferred to as a select or access terminal, is electrically connected togate 180 of access transistor 160.

The top plate 150 of capacitor 140 is electrically connected to floatinggate 130 of memory transistor 120 by a trace 137. There is no contact tofloating gate 130 of memory transistor 120. The capacitor 140 isdesigned to have a much higher capacitance (e.g., about 10 times) thanthat of memory transistor 120. The capacitor 140 capacitively couplesfloating gate 130 to n-type well 141. Thus, when a high erase voltage(e.g., about 14-22 V) is applied to the Vpp terminal, a voltage dropacross gate oxide 128 forms a sufficient electric field forFowler-Nordheim tunneling such that electrons are tunneled off floatinggate 130. As also shown in FIG. 1, p-type drain region 124 of memorytransistor 120 is electrically connected to n-type drain region 171(through n-type region 174) of access transistor 160 by a trace 138. Useof the NDMOS access transistor allows high voltages required for cellerase to be applied to the Vpp terminal without causing two junctions(N-well-P+_in the memory device in series with the N-well-P-well orN-well to substrate) breakdown.

Further details with respect to memory cell 100, including additionalalternative embodiments, are described in copending U.S. applicationSer. No. 11/498,672, filed on Aug. 2, 2006, the disclosure of which isincorporated herein by reference.

FIG. 2 is a schematic representation of a two-dimensional 3T memoryarray 200 according to one embodiment of the invention. The memory array200 includes a plurality of memory cells 210 that are organized in amatrix of rows and columns. Although three rows and three columns areshown, it should be understood that any number of rows and columns ofmemory cells can be formed, and is only limited by the number of cellsthat can be formed on a particular chip.

Each of memory cells 210 includes a floating gate memory transistor 220,a coupling capacitor 240, and a high voltage access transistor 260,which can respectively correspond to memory transistor 120, capacitor140, and access transistor 160 discussed with respect to FIG. 1. Thefloating gate memory transistor 220 is electrically connected to highvoltage access transistor 260. The floating gate memory transistor 220is configured to store a logic state. The coupling capacitor 240 iselectrically connected to memory transistor 220. The access transistorcan be a parasitic symmetrical or asymmetrical NDMOS or a high voltagedevice if present in a given technology.

The memory cells 210 are connected together in a matrix by word linesand bit lines arranged in a plurality of rows and columns. A first setof word lines (WL1, WL2, WL3, . . . WLx) each provides a Vcap bus linethat is electrically connected to each capacitor 240 in a respectiverow. A second set of word lines (WL1′, WL2′, WL3′, . . . WLx′) eachprovides a Vcg bus line that is electrically connected to each accesstransistor 260 in a respective row through a terminal 270.

A first set of bit lines (BL1, BL2, BL3, . . . BLx) each provides a busline that is electrically connected to each access transistor 260 in arespective column. A second set of bit lines (BL1′, BL2′, BL3′, . . .BLx′) each provides a Vpp bus line that is coupled to each memorytransistor 220 in a respective column. Various combinations of voltagescan be applied to the word lines and the bit lines to program, inhibit,read, or erase the logic state stored by memory transistor 220 in one ormore of the memory cells.

In a method of programming a single bit in a memory cell of memory array200, a first voltage is applied to a word line, in the first set of wordlines, connected to capacitor 240 of the memory cell to be programmed. Asecond voltage is applied to a word line, in the second set of wordlines, connected to access transistor 260 of the memory cell to beprogrammed, with the second voltage being equal to the first voltage. Abit line, in the first set of bit lines, connected to access transistor260 in the memory cell to be programmed is grounded. A third voltage isapplied to a bit line, in the second set of bit lines, connected tomemory transistor 220 of the memory cell to be programmed, with thethird voltage being greater than the first voltage. The third voltage issufficient to induce impact ionization current at the drain of memorytransistor 220. The impact ionization current generates energeticelectrons and holes that create avalanche multiplication. Bit lines, inthe second set of bit lines, not connected to the memory cell to beprogrammed are grounded, and word lines, in the first set of word lines,not connected to the memory cell to be programmed are also grounded.

In a method of erasing a single bit in a memory cell of memory array200, a word line, in the first set of word lines, connected to capacitor240 of the memory cell to be erased is grounded. A word line, in thesecond set of word lines, connected to access transistor 260 of thememory cell to be erased is also grounded. A first voltage is applied toa bit line, in the second set of bit lines, connected to memorytransistor 220 in the memory cell to be erased. A second voltage isapplied to word lines, in the first set of word lines, not connected tothe memory cell to be erased, with the second voltage being aboutone-half of the first voltage.

In a method of reading a single bit in a memory cell of memory array200, a first voltage is applied to a bit line, in the second set of bitlines, connected to memory transistor 220 in the memory cell to be read.A second voltage is applied to a word line, in the second set of wordlines, connected to access transistor 260 in the memory cell to be read,with the second voltage being greater than the first voltage. A wordline, in the first set of word lines, connected to capacitor 240 of thememory cell to be read is grounded.

Further details regarding program, erase, and read operations for memoryarray 200 are discussed hereafter.

As mentioned previously, program operations in the memory array arecarried out by channel hot carrier injection (avalanche programming),and erase operations in the memory array are carried out byFowler-Nordheim (F-N) tunneling.

In order to program a memory cell 210, such as by hot carrier injection,a program voltage level is applied to the Vpp terminal, and a selectvoltage level is applied to the Vcg terminal and the Vcap terminal. Theselect voltage level should be sufficient to turn on access transistor260. The program voltage level should be sufficient to induce avalanchemultiplication at the drain of the floating gate of the memorytransistor 220. For example, a positive voltage applied to the couplingcapacitor creates an electric field that aids hot electron transportfrom a silicon layer into the floating gate.

The program voltage may be externally applied or generated on chip. Theavalanche multiplication at the drain produces electron-hole pairs. Someof the electrons are hot enough to be injected into the floating gate ofmemory transistor 220 and are trapped therein to turn on memorytransistor 220 (i.e., memory transistor state changes from nonconductiveto conductive). The programming efficiency of this hot electroninjection mechanism increases with the increased voltage on the couplingcapacitor.

FIG. 2 further illustrates various operational functions at the bitlevel for memory array 200. The program voltage level can be about 5-15V. A program condition for the programming function (e.g., avalancheprogramming) of a cell M in memory array 200 follows:

-   -   (1) To program cell M at WL=2 and BL=2: WL2=WL2′=about 5V,        BL2′=Vpp (on the order of about 10 V for the 0.5 u long PMOS        storage device), BL2=0;        -   a. Row inhibit: all cells on WL2 will see VWL2=WL2′=5V,            program inhibit in this row must be achieved by applying            BL1′=BL3′=0 V.    -   (2) If cell at WL=2 and BL=3 is programmed; then BL1′ or        BL3′=5V; not enough to erase;        -   a. If an erased cell is on BL1′ or BL3′ sees 5V; don't care.        -   b. Column inhibit: all cells on BL2′ will see Vpp,            WL1=WL3=0; no disturb in WL1 or WL2 for erased or programmed            cells.

In order to erase a memory cell, an erase voltage that is sufficient toform the necessary electric field to induce F-N tunneling must bedropped across the gate dielectric of the memory transistor (storagePMOS). The erase voltage Vpp is applied to a BLx′ terminal, while theVcg terminal and the Vcap terminal are connected to ground. The erasevoltage level can be about 14-22 V. The erase operation can be used tosimultaneously erase all cells connected to a common Vpp bus.

A program condition for the erase function of cell M in memory array 200at the bit level (e.g., bit at WL=2 and BL=2) follows:

-   -   (1) To erase: BL2′=about 17 V, WL2=WL2′=0V        -   Erase inhibit: WL1=WL3=about ½ of the Vpp

To inhibit programming or erasure of the memory cell, the Vcg terminalshould be connected to ground.

The memory cell can be read by applying a significantly lower readvoltage (e.g., approximately 1 V) to the Vpp terminal while the Vcgterminal receives a select voltage level.

A program condition for the read function of cell M in memory array 200at the bit level follows:

-   -   (1) Read: BL2′=1 V, WL2′=5 V and Vcap=0

A memory array construction with a single point high voltage supply isof interest for embedded applications since it does not requirespecialized high voltage devices over and above the parasitic NDMOSaccess device naturally present in any CMOS technology. Such a memoryarray 300 is shown in FIG. 3 according to another embodiment of theinvention. The memory array 300 includes a plurality of memory cells 310that are organized in a matrix of rows and columns. Erase operations inmemory array 300 are carried out by F-N tunneling, and programoperations in memory array 300 are carried out by hot carrier injection.

Each of the memory cells 310 includes a floating gate memory transistor320, a coupling capacitor 340, and a high voltage access transistor 360,which can respectively correspond to memory transistor 220, capacitor240, and access transistor 260 discussed with respect to FIG. 2. Thememory transistor 320 is electrically connected to access transistor360. The coupling capacitor 340 is electrically connected to memorytransistor 320.

The memory cells 310 are connected together in a matrix by word linesand bit lines arranged in a plurality of rows and columns. A first setof word lines (WL1, WL2, WL3, . . . WLx,) each provides a Vcap bus linethat is electrically connected to each capacitor 340 in a respectiverow. A second set of word lines (WL1′, WL2′, WL3′, . . . WLx′) eachprovides a Vcg bus line that is electrically connected to each accesstransistor 360 in a respective row through a terminal 370. A first setof bit lines (BL1, BL2, BL3, . . . BLx) each provides a bus line that iselectrically connected to each access transistor 360 in a respectivecolumn.

The access transistors 360 in memory array 300 can be symmetrical NDMOSdevices. Such access devices connected to the same bit line BLx areplaced in series with a low voltage column address transistor 374 ineach column. The column address transistor 374 is isolated from highvoltage by the symmetrical NDMOS devices.

A second set of bit lines (BL1′, BL2′, BL3′, . . . BLx′) are allconnected together and routed to a single voltage supply point PP wherehigh voltages required for cell programming and erasure are supplied.Program and erase voltages can be respectively generated by a Vppprogram charge pump 380 and a Vpp erase charge pump 384, which can beconstructed entirely of low voltage devices.

In a method of programming a single bit in a memory cell of memory array300, a program voltage is applied to voltage supply point PP fromprogram charge pump 380. A first voltage is applied to a word line, inthe first set of word lines, connected to capacitor 340 of the memorycell to be programmed. A second voltage is applied to a word line, inthe second set of word lines, connected to access transistor 360 of thememory cell to be programmed, with the second voltage equal to the firstvoltage. Word lines, in the first set of word lines, not connected tothe memory cell to be programmed are grounded, and word lines, in thesecond set of word lines, not connected to the memory cell to beprogrammed are also grounded. The column address transistor 374 in thecolumn supporting the memory cell to be programmed is activated.

In one implementation, programming is accomplished by application of theprogram Vpp to the voltage supply point PP, with WLx and WLx′ linesalong the programmed cell(s) biased to about 5 V, and the other WLx andWLx′ lines at ground. The address transistor 374 in the columnsupporting the programmed bit is then activated. A write inhibit can beaccomplished by grounding address (Addr) lines (1, 2, 3, etc.) incolumns where writing is not needed.

In a method of erasing a single bit in a memory cell of memory array300, an erase voltage is applied to voltage supply point PP from erasecharge pump 384. A word line, in the first set of word lines, connectedto capacitor 340 of the memory cell to be erased is grounded, and a wordline, in the second set of word lines, connected to access transistor360 of the memory cell to be erased is also grounded. A first voltage isapplied to word lines, in the first set of word lines, not connected tothe memory cell to be erased. A second voltage is applied to word lines,in the second set of word lines, not connected to the memory cell to beerased, with the second voltage being equal to the first voltage. Theaddress transistor 374 in the column supporting the memory cell to beerased is grounded. The entire memory array 300 can be erased at once byapplication of a high Vpp (about 14-22 V) to voltage supply point PPwith all WLx and WLx′ lines grounded.

In a method of reading a single bit in a memory cell of memory array300, a first voltage is applied to a bit line, in the second set of bitlines, connected to memory transistor 320 in the memory cell to be read.A second voltage is applied to a word line, in the first set of wordlines, connected to capacitor 340 in the memory cell to be read, withthe second voltage being greater than the first voltage. A word line, inthe second set of word lines, connected to access transistor 360 of thememory cell to be read is grounded. Word lines, in the first set of wordlines, not connected to the memory cell to be read are grounded, andword lines, in the second set of word lines, not connected to the memorycell to be read are also grounded. The column address transistor 374 inthe column supporting the memory cell to be read is activated.

In one implementation, a read operation requires about 1 V on voltagesupply point PP, and a word line WLx of the read row is biased to about5 V. All other word lines WLx are at 0 V, and all word lines WLx′ are at0 V. A set of address signals are then sent to Addr line inputs for thememory cell(s) to be read.

The present invention may be embodied in other specific forms withoutdeparting from its essential characteristics. The described embodimentsand methods are to be considered in all respects only as illustrativeand not restrictive. The scope of the invention is therefore indicatedby the appended claims rather than by the foregoing description. Allchanges that come within the meaning and range of equivalency of theclaims are to be embraced within their scope.

1. A method of erasing a single bit in a memory cell of a memory array,the method comprising: grounding a word line, in a first set of wordlines, connected to the memory cell to be erased, wherein the memorycell is one of a plurality of memory cells organized in a matrix of rowsand columns, each of the memory cells comprising: an access transistor;a floating gate memory transistor electrically connected to the accesstransistor; and a coupling capacitor electrically connected to thememory transistor; grounding a word line, in a second set of word lines,connected to the memory cell to be erased; applying a first voltage to abit line connected to the memory cell to be erased; and applying asecond voltage to word lines, in the first set of word lines, notconnected to the memory cell to be erased, the second voltage beingabout one-half of the first voltage.
 2. The method of claim 1, whereinthe memory cells are organized in a two-dimensional array.
 3. The methodof claim 1, wherein the memory cells each comprise a capacitor terminalelectrically connected to the coupling capacitor, a program terminalelectrically connected to the memory transistor, and a control terminalelectrically connected to the access transistor.
 4. The method of claim1, wherein the high voltage access transistor comprises a gate oxidelayer having a thickness of up to about 20 nm.
 5. The method of claim 1,wherein the floating gate memory transistor comprises a gate oxide layerhaving a thickness of up to about 20 nm.
 6. The method of claim 1,wherein the coupling capacitor comprises a gate oxide layer having athickness of up to about 20 nm.
 7. The method of claim 1, wherein: thefirst set of word lines is electrically connected to the couplingcapacitor in each of the memory cells in a respective row; the secondset of word lines is electrically connected to the access transistor ineach of the memory cells in a respective row; the first set of bit linesis electrically connected to the access transistor in each of the memorycells in a respective column; and the second set of bit lines iselectrically connected to the memory transistor in each of the memorycells in a respective column.
 8. The method of claim 1, wherein theerasing is carried out by Fowler-Nordheim tunneling.
 9. The method ofclaim 1, wherein the first voltage is sufficient to form an electricfield to induce Fowler-Nordheim tunneling.
 10. The method of claim 1,wherein the first voltage is about 14-22 volts.
 11. A method of erasinga single bit in a memory cell of a memory array, the method comprising:providing a memory array comprising: a plurality of memory cellsorganized in a matrix of rows and columns, each of the memory cellscomprising: a high voltage access transistor; a floating gate memorytransistor electrically connected to the access transistor; and acoupling capacitor electrically connected to the memory transistor; afirst set of word lines each electrically connected to the couplingcapacitor in each of the memory cells in a respective row; a second setof word lines each electrically connected to the access transistor ineach of the memory cells in a respective row; a first set of bit lineseach electrically connected to the access transistor in each of thememory cells in a respective column; a second set of bit lines eachelectrically connected to the memory transistor in each of the memorycells in a respective column, the second set of bit lines eachelectrically connected together; a plurality of column addresstransistors each electrically connected to a bit line in the first setof bit lines; a single voltage supply point electrically connected tothe second set of bit lines; a program charge pump electricallyconnected to the voltage supply point; and an erase charge pumpelectrically connected to the voltage supply point; applying an erasevoltage to the voltage supply point; grounding a word line, in the firstset of word lines, connected to the capacitor of the memory cell to beerased; grounding a word line, in the second set of word lines,connected to the access transistor of the memory cell to be erased;applying a first voltage to word lines, in the first set of word lines,not connected to the memory cell to be erased; applying a second voltageto word lines, in the second set of word lines, not connected to thememory cell to be erased, the second voltage equal to the first voltage;and grounding a column address transistor in a column supporting thememory cell to be erased.
 12. The method of claim 11, wherein the memorycells are organized in a two-dimensional array.
 13. The method of claim11, wherein the memory cells each comprise a capacitor terminalelectrically connected to the coupling capacitor, a program terminalelectrically connected to the memory transistor, and a control terminalelectrically connected to the access transistor.
 14. The method of claim11, wherein the high voltage access transistor comprises a gate oxidelayer having a thickness of about 10-15 nm.
 15. The method of claim 11,wherein the floating gate memory transistor comprises a gate oxide layerhaving a thickness of about 10-15 nm.
 16. The method of claim 11,wherein the coupling capacitor comprises a gate oxide layer having athickness of about 10-15 nm.
 17. The method of claim 11, wherein theerasing is carried out by Fowler-Nordheim tunneling.
 18. The method ofclaim 11, wherein the first voltage is sufficient to form an electricfield to induce Fowler-Nordheim tunneling.
 19. The method of claim 11,wherein the first voltage is about 14-22 volts.
 20. The method of claim11, wherein the erase voltage is provided by the erase charge pump.